Study of post-develop defect on typical EUV resist - (PPT)

机译：典型EUV抗蚀剂开发缺陷的研究 - （PPT）

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Blob and Residue are common defect for each generation resist. How about EUV? There are specific defects for each generation resist. How about EUV? Goal of this study is to understand common/specific defect on EUV resist processing.

机译：Blob和残留物是每代抗蚀剂的常见缺陷。 euv怎么样？每个代抗蚀剂都有特定的缺陷。 euv怎么样？本研究的目标是了解EUV抗蚀剂处理的常见/特定缺陷。

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《International Symposium on Extreme Ultraviolet Lithography》|2011年||共1页
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Masahiko Harumoto; Kazuhito Shigemori; Akihiro Hisai; Masaya Asai; Koji Kaneyam;
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中图分类 TN305.7-53;
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Study of post-develop defect on typical EUV resist - (PPT)

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