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A Surface Field Based Model for Ultra Thin Body Undoped Symmetric DG MOSFETs

机译:基于表面场的超薄体外对称DG MOSFET模型

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In this paper, we present a fast yet accurate semi-analytical model for the I-V and C-V characteristics of nanoscale undoped symmetric double gate (DG) MOSFETs. The model employs a simple parabolic potential approximation for the body potential in the coordinate normal to the interfaces in the all regions of operation. To include quantum effects in the model, the Schrodinger's equation is analytically solved in one dimensional quantum well. The calculated surface electric field is used in a compact classical model of the symmetric DG MOSFET as a core model. Some quantum effects which include the threshold voltage shift and effective oxide thickness increment are applied through some modifications to the core model. To assess the accuracy of the proposed model, the results of the model are compared to those of the numerical simulations. The comparison reveals the high accuracy of the proposed model.
机译:在本文中,我们为纳米级未掺杂的对称双栅极(DG)MOSFET的I-V和C-V特性提供了一种快速且精确的半分析模型。该模型采用简单的抛物线电位近似,用于在所有操作区域中的接口中的坐标中的身体电位。为了在模型中包括量子效应,Schrodinger的等式在一维量子阱中被分析解决。计算出的表面电场用于对称DG MOSFET的紧凑型经典模型作为核心模型。通过对核心模型的一些修改施加一些包括阈值电压移位和有效氧化物厚度增量的一些量子效应。为了评估所提出的模型的准确性,将模型的结果与数值模拟的结果进行比较。比较揭示了所提出的模型的高精度。

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