首页> 外文会议>International Symposium on Circuits and Systems >2×VDD-Tolerant Crystal Oscillator Circuit Realized With 1×VDD CMOS Devices Without Gate-Oxide Reliability Issue
【24h】

2×VDD-Tolerant Crystal Oscillator Circuit Realized With 1×VDD CMOS Devices Without Gate-Oxide Reliability Issue

机译:2×VDD耐受晶体振荡器电路,实现1×VDD CMOS器件,无栅极可靠性问题

获取原文

摘要

A new 2×VDD-tolerant crystal oscillator circuit realized with 1×VDD CMOS devices without suffering gate-oxide reliability issue is proposed, which is one of the key mixed-voltage I/O cells in a cell library. The proposed circuit is realized with only thin gate-oxide devices with floating n-well technique. The proposed 2×VDD-tolerant crystal oscillator circuit has been designed and verified in a 90-nm 1-V CMOS process to serve 1/2-V mixed-voltage interface applications.
机译:提出了一种新的2×VDD耐受晶体振荡器电路,其实现了没有遭受氧化栅极可靠性发出的1×VDD CMOS器件,这是细胞库中的关键混合电压I / O细胞之一。所提出的电路仅用具有浮动N阱技术的薄栅极氧化物器件实现。所提出的2×Vdd耐受晶体振荡器电路已经设计和验证了90-Nm 1-V CMOS工艺,以提供1/2-V混合电压接口应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号