...
首页> 外文期刊>Device and Materials Reliability, IEEE Transactions on >Two ESD Detection Circuits for 3$times$ VDD-Tolerant I/O Buffer in Low-Voltage CMOS Processes With Low Leakage Currents
【24h】

Two ESD Detection Circuits for 3$times$ VDD-Tolerant I/O Buffer in Low-Voltage CMOS Processes With Low Leakage Currents

机译:在低泄漏电流的低压CMOS工艺中,两个ESD检测电路可提供3倍VDD耐压的I / O缓冲器

获取原文
获取原文并翻译 | 示例
           

摘要

Two novel 3$times$VDD-tolerant electrostatic discharge (ESD) protection circuits using only low-voltage devices without extra power consumption are proposed for 0.18- $muhbox{m}$ 1.8-V and 90-nm 1.2-V CMOS processes, respectively. Stacked-capacitor technique and bias circuit are adopted in the two designs. The proposed ESD detection circuits can generate 36- and 38-mA currents to trigger the ESD clamp device under the ESD event. Under normal operating conditions, all the devices are free from the gate-oxide reliability threat. The leakage currents of the 0.18- $muhbox{m}$ and 90-nm circuits are 0.9 and 200 nA under 3 $times$VDD, respectively. The simulation results show that both the circuits can be successfully used for 3$times$VDD-tolerant I/O buffers.
机译:提出了两种新颖的3倍VDD容忍的静电放电(ESD)保护电路,它们仅使用低压器件而没有额外的功耗,以用于0.18- $ muhbox {m} $ 1.8-V和90-nm 1.2-V CMOS工艺,分别。两种设计均采用堆叠电容器技术和偏置电路。所提出的ESD检测电路可以产生36mA和38mA电流,以在ESD事件下触发ESD钳位器件。在正常工作条件下,所有设备均不受栅极氧化物可靠性威胁的影响。在3乘以VDD时,0.18-muhbox {m} $和90-nm电路的泄漏电流分别为0.9和200 nA。仿真结果表明,两个电路均可成功用于3倍VDD容限的I / O缓冲器。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号