Thermal Wave Analysis of Implanted Layers in Semiconductors: Measurement Performance vs. Process Requirements

摘要

Monitoring process stability and controlling process parameters are key issues for metrology applications in modern fab environment. Consequently, three major demands arise for metrology tool performance, i) appropriate sensitivity to monitor process changes within given specifications, ii) adequate repeatability and therefore, long-term stability of the equipment and iii) the development of standardized qualification and approval procedures to guarantee the equipment capability to fulfill process requirements.