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Study of Ag-In solder as low temperature wafer bonding intermediate layer

机译:作为低温晶片键合中间层的Ag - 焊料研究

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Indium-silver as solder materials for low temperature bonding had been introduced earlier. In theory the final bonding interface composition is determined by the overall materials composition. Wafer bonding based multiple intermediate layers facilitates precise control of the formed alloy composition and the joint thickness. Thus the bonding temperature and post-bonding re-melting temperature could be easily designed by controlling the multilayer materials. In this paper, a more fundamental study of In-Ag solder materials is carried out in chip-to-chip level by using flip-chip based thermocompression bonding. Bonding at 180°C for various time duration under various bonding pressure is studied. Approaches of forming Ag_2In with re-melting temperature higher than 400°C at the bonding interface are proposed and discussed. Knowledge learned in this process technology can support us to develop sophisticated wafer level packaging process based wafer bonding for applications of MEMS and IC packages.
机译:铟 - 银作为低温粘合的焊料材料已经提前引入。理论上,最终粘合界面组合物由整体材料组合物决定。基于晶片键合的多个中间层有助于精确控制形成的合金组合物和关节厚度。因此,通过控制多层材料,可以容易地设计键合温度和后键合的再熔化温度。在本文中,通过使用基于倒装芯片的热压键合的芯片对芯片水平进行了更基础的研究。研究了在180℃下在各种粘合压力下键合。提出并讨论了在粘合界面处具有高于400℃的重新熔化温度的AG_2IN的方法。在该过程技术中学到的知识可以支持我们开发复杂的晶片水平包装过程基于晶片键合的晶片键合,用于MEMS和IC封装的应用。

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