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Effects of spacer growth temperature on the optical properties of quantum dot laser structures

机译:间隔型生长温度对量子点激光结构光学性质的影响

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Electroluminescence (EL) and its temperature dependence of InAs quantum dots embedded in In_(0.15)Ga_(0.85)As quantum well [dots in a well (DWELL)] have been investigated as functions of the growth temperature of the GaAs spacer layer. The EL intensity at room temperature increases as the spacer growth temperature increases. The integrated EL intensity as a function of injection current at room temperature for all samples shows that at low currents, the gradients are superlinear but this superlinearity decreases as the spacer growth temperature is increased. From a simple analysis of the generation-recombination rate equations, it can be shown that the superlinearity stems from the nonradiative recombination being the dominant recombination process. As the spacer growth temperature is increased, this nonradiative recombination become less dominant. An Arrhenius plot of the temperature dependence of the EL intensity gives an activation energy of ~300 ±15 meV at high temperature. The dominant loss mechanism is therefore concluded to be the electron escape from the quantum dot ground state to the GaAs barrier.
机译:已经研究了嵌入In_(0.15)Ga_(0.85)中的INAS量子点的电致发光(EL)及其温度依赖性作为GaAs间隔层的生长温度的函数,已经研究了in_(0.15)Ga_(0.85)的量子阱[阱(停留)中的点。随着间隔型生长温度的增加,室温下的EL强度增加。作为喷射电流在室温下的集成EL强度,所有样品的喷射电流都表明,在低电流下,梯度是超线性,但随着间隔的生长温度增加,该超线性降低。从简单的发电重组率方程分析,可以示出超线性源于非阵列重组是主要的重组过程。随着间隔型生长温度的增加,这种非相互作用的重组变得不那么优势。 EL强度的温度依赖性的Arrhenius图在高温下使活化能量为约300±15meV。因此,总结损耗机制得出结论是从量子点接地状态到GaAs屏障的电子逃逸。

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