首页> 外国专利> THE METHOD OF VERTICAL STACKING OF SELF ASSEMBLED QUANTUM DOTS USING TEMPERATURE ALTERNATING IN SPACER LAYER GROWTH STEP

THE METHOD OF VERTICAL STACKING OF SELF ASSEMBLED QUANTUM DOTS USING TEMPERATURE ALTERNATING IN SPACER LAYER GROWTH STEP

机译:间隔层生长步骤中温度交替变化对自组装量子点的垂直堆积方法

摘要

The present invention relates to a technique vertically stacked quantum dots layers as a semiconductor quantum dot structure is formed. In order to laminate a single-layer quantum dots grown by spontaneous formation method using the difference (lattice mismatch) in the lattice constant (self assembled growth mode) vertically from a number of method for forming the quantum dots is the surface of the cover layer formed on the quantum dot layer of uniformity it is very important. By rising the quantum dot surface shape of each layer to be laminated to a high temperature during the temperature of growing the capping layer after growing the quantum dot as a way to maintain a constant to each floor, that is, after growing the capping layer at a constant thickness of cover nophyeoseo the layer growth temperature when growing the remainder of the cover layer and improve the surface uniformity of the covering layer, it is possible to improve the uniformity of the quantum dot layer also formed on the cover layer.
机译:技术领域本发明涉及在形成半导体量子点结构时垂直堆叠的量子点层的技术。为了层叠通过自发形成方法生长的单层量子点,该自发形成方法利用多种形成量子点的方法垂直地利用晶格常数的差异(晶格失配)(自组装生长模式)来形成被覆盖层的表面在量子点上形成均匀的层非常重要。通过在生长量子点之后生长覆盖层的温度期间将待层压的各层的量子点表面形状升高至高温,以保持各层恒定,也就是在如下温度生长覆盖层之后在使覆盖层的其余部分生长时,恒定厚度的覆盖层使层生长温度升高,并提高覆盖层的表面均匀性,可以提高也形成在覆盖层上的量子点层的均匀性。

著录项

  • 公开/公告号KR100520744B1

    专利类型

  • 公开/公告日2005-10-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030022033

  • 发明设计人 박광민;윤의준;황희돈;

    申请日2003-04-08

  • 分类号H01L21/20;

  • 国家 KR

  • 入库时间 2022-08-21 22:03:21

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