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AMORPHOUS CARBON FILM DEPOSITION BY MAGNETICALLY-DRIVEN SHUNTING ARC DISCHARGE

机译:通过磁力驱动的分流电弧放电非晶碳膜沉积

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A magnetically driven shunting arc discharge as a pulsed metal/solid plasma source has been developed. The shunting arc plasma is generated around a carbon rod with a diameter of 2 mm and a length of 40 mm bridged between electrodes. The plasma is driven by the magnetic field generated by the arc current itself. The peak arc current with a sinusoidal waveform is 1.7 kA at a 20 μF capacitor charging voltage of 1 kV. The plasma was accelerated along the rail with average velocity of 4 km/sec in pressure range from 0.054 to 1.4 Pa, and went out towards a target set at 40 mm apart from the muzzle. The deposition rate of a carbon film was obtained to 100 nm for a process time of 1 min. The carbon film was in an amorphous state and a typical Raman spectrum with the D and G band was observed.
机译:已经开发了作为脉冲金属/固体等离子体源的磁驱动电弧放电。旋转电弧等离子体围绕直径为2mm的碳棒和桥接在电极之间的长度为40mm。等离子体由由电弧电流本身产生的磁场驱动。具有正弦波形的峰值电弧电流为1.7 ka,在1kV的20μF电容充电电压下。沿着轨道加速等离子体,平均速度为4km /秒,压力范围为0.054至1.4 pa,并朝向与枪口相比为40毫米的靶设定。将碳膜的沉积速率得到100nm,用于1分钟的处理时间。碳膜处于非晶状态,观察到具有D和G带的典型拉曼光谱。

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