Amorphous carbon film deposition by PBII&D using shunting arc discharge

摘要

Amorphous carbon films were deposited using a magnetically driven shunting arc (MDSA) discharge in methane gas circumstance with a deposition rate of 100 nm/min in plasma-based ion implantation and deposition method. The target was immersed in the plasma to deposit films and to extract ions from the ion sheath that evolves around the target. The extracted ion current characteristics and the deposited film feature were investigated in comparison with the previous highly evacuated ambient shunting arc discharge. The ion current was found to be increased by MDSA generation in methane gas case. This result suggests that methane gas is ionized by the MDSA. The hydrogen concentration of the prepared carbon films is 20-30% for the no methane case, while the hydrogen concentration is 40-50% for the shunting arc discharge in methane gas.