Controlled deposition of wedge-shaped profiles for thin (～10A) layers by pulsed laser deposition

摘要

A method yielding precisely controlled thickness profiles in thin-film growth is necessary for continuous compositional spread techniques. While multiple approaches have been introduced and successfully tested, some specific applications require the use of very thin "wedge"-type profiles (-10 A at the thickest point), while at the same time yielding lateral sample sizes of several centimeters. Here we introduce the basic principles of a pulsed-laser deposition based approach utilizing the translation of the substrate behind a slit-shaped aperture and demonstrate by simple calculations that this method can satisfy these requirements.