首页> 外文会议>Symposium on mechanical properties of nanostructured materials and nanocomposites >Deposition of TiN/NbN Superlattice Hard Coatings by Ionised Magnetron Sputter Deposition
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Deposition of TiN/NbN Superlattice Hard Coatings by Ionised Magnetron Sputter Deposition

机译:通过电离的磁控溅射沉积沉积锡/ NBN超晶格硬涂层

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We have investigated the effect of ion bombardment on the structure and hardness of thin coatings of TiN/NbN multilayered structures and monolithic films of both TiN and NbN. A radio frequency coil was used to generate an additional inductively coupled plasma between the substrate and the target enabling the sample to be bombarded by a high flux of relatively low energy ions under the appropriate conditions. It is shown that the effect of such bombardment in the case of the monolithic films is to reduce the porosity. This gave an increase in die hardness of both the TiN and the NbN films up to a power of 100 W (using a coil with a cross-sectional area of 2 * 10~3 mm~2). Further increasing the power density led to a decrease in hardness, TiN/NbN multilayer coatings were made under the optimum deposition conditions for the monolithic materials and gave hardnesses greater than those observed in either TiN or NbN and approximately 50% greater than that predicted by a mixtures rule.
机译:我们研究了离子轰击对锡/ NBN多层结构的薄涂层结构和硬度和锡和NBN的整体膜的影响。射频线圈用于在基板和靶之间产生另外的电感耦合等离子体,使得在适当的条件下通过相对低的能量离子的高通量轰击样品。结果表明,这种轰击在整体膜的情况下的效果是降低孔隙率。这使得锡和NBN薄膜的模具硬度增加到100W的功率(使用横截面积为2×10〜3mm〜2的线圈)。进一步增加功率密度导致硬度降低,在整体材料的最佳沉积条件下制备锡/ NbN多层涂层,并使硬度大于在锡或Nbn中观察到的硬度,而大约50%比a预测的大约50%混合规则。

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