首页> 外国专利> Powder coating process, especially magnetron sputter or cathodic arc deposition of a metallic, ceramic, vitreous or organic coating, comprises vibrating the powder in a dish-like receptacle before or during coating

Powder coating process, especially magnetron sputter or cathodic arc deposition of a metallic, ceramic, vitreous or organic coating, comprises vibrating the powder in a dish-like receptacle before or during coating

机译:粉末涂层工艺,尤其是金属,陶瓷,玻璃或有机涂层的磁控溅射或阴极电弧沉积,包括在涂层之前或过程中在盘状容器中振动粉末

摘要

A powder coating process comprising powder supply before or during coating to a dish-like receptacle vibrated at a specified frequency and amplitude is new. In an apparatus and process for coating powder particles which tend to agglomerate in the uncoated and/or coated state, the powder is supplied, before or during coating, to a dish-like receptacle which is vibrated at a frequency of 10-200 Hz and an amplitude of 0.1-1 mm. An Independent claim is also included for a method of layer deposition on powder particles using the above apparatus.
机译:新的粉末涂覆工艺是新的,该工艺包括在涂覆之前或过程中将粉末供应到以特定频率和振幅振动的碟形容器。在用于涂覆易于在未涂覆和/或涂覆状态下附聚的粉末颗粒的设备和方法中,在涂覆之前或涂覆过程中,将粉末供应至以10-200Hz的频率振动的盘状容器中,并且幅度为0.1-1毫米。还包括使用上述设备在粉末颗粒上进行层沉积的方法的独立权利要求。

著录项

  • 公开/公告号DE19921942A1

    专利类型

  • 公开/公告日2000-11-30

    原文格式PDF

  • 申请/专利权人 MUCHA ANDREAS;SIEGERT LOTHAR;

    申请/专利号DE1999121942

  • 发明设计人 SIEGERT LOTHAR;MUCHA ANDREAS;

    申请日1999-05-12

  • 分类号C23C14/00;B01J2/30;C04B35/628;

  • 国家 DE

  • 入库时间 2022-08-22 01:10:33

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