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Monte Carlo Investigation of Ferroelectric Properties in Thin Films

机译:蒙特卡洛对薄膜铁电特性的研究

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In this work, the ferroelectric hysteresis in thin films was investigated with Monte Carlo simulation using the DIFFOUR Hamiltonian and the Metropolis algorithm. The field frequency, the filed amplitude and the thickness dependence of hysteresis properties were found. For instance, at high enough field, the area increases, maintains and reduces with increasing frequency. However, with increasing the film's thickness, the area increases over the whole considered frequencies, and the frequency at maximum area shifts to a lower frequency due to the stronger ferroelectric coupling in thicker films. In addition, the scaling relation among the hysteresis properties, the film's thickness and the field parameters in the power law form were also investigated, where the scaling exponents were compared and discussed with experiments on thin ferroelectric films.
机译:在这项工作中,使用Diffour Hamiltonian和Metropolis算法对蒙特卡罗模拟进行了薄膜的铁电滞后。发现场频率,归档幅度和滞后性能的厚度依赖性。例如,在足够高的场上,该区域增加,维持并随着频率的增加而减小。然而,随着薄膜的厚度的增加,该区域随着整体所考虑的频率而增加,并且由于较厚的薄膜中的铁电耦合强,最大面积的频率变为较低的频率。另外,还研究了滞后性能,膜的厚度和场参数之间的缩放关系,其中比较了缩放指数并用薄铁电膜的实验讨论。

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