Sulfuric acid (H/sub 2/SO/sub 4/) and ozone (O/sub 3/) mixture process (SOM) with in-situ concentration monitor for O/sub 3/ and peroxyso-di-sulfuric acid (H/sub 2/S/sub 2/O/sub 8/) was developed Ultraviolet spectrometers with 190-200 nm and 254 nm of wavelength were used to detect H/sub 2/S/sub 2/O/sub 8/ and O/sub 3/ dissolved in SOM, respectively. In order to mix H/sub 2/SO/sub 4/ and O/sub 3/ effectively, the O/sub 3/ gas ejectors were jointed to a quartz bath directly. Using SOM process with UV oxidant monitors and O/sub 3/ gas ejectors, heavily dosed resist and dry etched resist could be removed perfectly without dry ashing process.
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机译：硫酸（H / SU / SO / SUP 4 /）和臭氧（O / SUB 3 /）混合物方法（SOM）具有原位浓度监测液，用于O / SUB 3 /和过氧脱氧 - 二硫酸（H / Sub 2 / s / sub 2 / sub 8 /）由190-200nm和254nm的波长开发出紫外光谱仪，用于检测H / sub 2 / s / sub 2 / su / su / su / su / s分别分别在SOM中溶解。为了有效地混合H / SUP 2 / SO / SO / SO / SU / SO / SU / SO / SU / SU / SU / SU / SU / SU / SU / SU / SU / SOU喷射器，直接连接到石英浴。使用具有UV氧化监视器和O / Sub 3 /气体喷射器的SOM方法，可以在没有干灰化过程的情况下完美地除去严重的抗蚀剂和干蚀刻抗蚀剂。
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