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GaN/Quantum Dots/GaN Wafer Bonded Structure: Thiophenethiol Capped CdSe/ZnS Quantum Dots as Active Layer and Binding Layer

机译:GaN / Quantum点/ GaN晶片粘合结构:噻吩硫醇封装Cdse / ZnS量子点作为有源层和粘合层

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Wafer bonding technology is applied to the GaN/quantum dots/GaN p-i-n system. Processing conditions for successful wafer bonding are described. Temperature dependence of bond strength properties are characterized. Strongest bonding is achieved when annealing temperature is 350°C as a result of cross-linking due to the bidehtate nature of the thiophene thiol ligand. Electrical properties of bonded heterostructures are studied, in which a diode like I-V curve and multiple conduction channels are observed. Optical properties of the QDs active layer after bonding are also investigated.
机译:晶圆键合技术应用于GaN / Quantum Dots / GaN P-I-N系统。描述了成功晶片键合的处理条件。表征粘合强度特性的温度依赖性。由于噻吩硫醇配体的Bidehtate性质,当退火温度为350℃时,实现最强的粘合。研究了键合异质结构的电性能,其中观察到诸如I-V曲线和多个传导通道等二极管。还研究了QDS活性层的光学性质。

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