Investigation of Growth Processes and Surface Morphology of Fine Grain Diamond Films Grown by High Repetition Rate Pulsed Laser Deposition (PLD) Technique.

摘要

Pulsed laser deposition (PLD) employing a Cu-vapor laser has been used for deposition of nano-crystalline diamond films.Fine grain diamond films have been grown uniformly at room temperature without seeding or abrasion of the substrates (Si,quartz,glass and plastic).It has been found that films deposited by the above mentioned technique are transparent,have very high electrical resistivity (typically of order of 100GOMEGA-cm) and a peak in the optical absorption at about 6.0 eV.Transmission electron microscopy (TEM) and selected area electron diffraction (SAD) pattern confirmed the nano-crystalline structure of the films.Ten nanometre sized clusters are observed within an amorphous matrix whose diffraction patterns were indexed as a cubic diamond.