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TEM nanoscale analysis of InAs quantum dots grown on GaAs by MBE

机译:MBE在GaAs上种植的INAS纳米级分析

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We report the application of various high resolution and analytical transmission electron microscopy (TEM) techniques to study the microstructural properties of self-assembled InAs dots formed in a GaAs(001) matrix. Two samples grown under otherwise identical conditions but with different growth rates have been studied. TEM measurements of the dot densities, compositions and morphologies were performed and the results compared with optical measurements of the same samples. The lower ground state emission energy observed for the slow growth rate sample supports TEM results which show that these dots are taller than those grown with the fast growth rate. The dot density is found to increase with growth rate; consistent with a similar observation for uncapped samples. The use energy dispersive spectroscopy (EDS) techniques enables the dot composition profiles to be deduced.
机译:我们报告了各种高分辨率和分析透射电子显微镜(TEM)技术的应用,研究了在GaAs(001)基质中形成的自组装InAs点的微观结构性质。在否则的条件下种植但具有不同的增长率的两个样品已经研究过。进行点密度,组合物和形态的TEM测量,并与相同样品的光学测量相比的结果。对于缓慢的生长速率样品观察到的较低的地面发射能量支持TEM结果,表明这些点高于具有快速生长速率的点高。发现点密度随着生长速率而增加;一致与未提取的样本类似的观察。使用能量分散光谱(EDS)技术使得能够推导出点组合物。

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