Texture of Sputtered Thin Copper Films on Amorphous SiO_2 and Si_3N_4 substrates

摘要

Cu films with thickness of 500nm and 5 nm have been sputter deposited on amorphous SiO_2 and Si_3N-4 substrates without and after sputter cleaning.The crystallographic texture has been characterized by x-ray diffraction techniques.Sputter cleaning of the substrates,by which the oxygen contaminants are removed from the Si_3N_4 substrates,leads to an increase in the {111} texture strength and sharpness of the Cu films on Si_3N_4.The texture ios sharper in the 500nm thick Cu films than in the 5nm thick films.Roughness differences of the substrate surfaces have no obvious effect on the texture state.