首页> 外国专利> Copper thin film substrate with a undercoating agent, a method of manufacturing a thin copper film with the substrate and the copper thin film substrate with and electrically conductive film,

Copper thin film substrate with a undercoating agent, a method of manufacturing a thin copper film with the substrate and the copper thin film substrate with and electrically conductive film,

机译:具有底涂层剂的铜薄膜基板,具有该基板的铜薄膜的制造方法以及具有导电膜的铜薄膜基板,

摘要

PROBLEM TO BE SOLVED: To provide an undercoating agent which is excellent not only in initial adhesiveness between a substrate and a copper thin film but also in adhesiveness between a substrate and a copper thin film after the copper thin film substrate is treated with an alkali solution and an acidic solution.SOLUTION: There is provided an undercoating agent for a substrate with a copper thin film which comprises: an acrylic copolymer (A) having a hydroxyl group, an alkyl ester group, a nitrile group and a primary amide group; a polyisocyanate (B) having at least three isocyanate groups; an active energy ray-polymerizable compound (C) having at least three carbon-carbon double bond-containing groups; and a reactive alkoxysilyl compound (D) represented by the general formula (1) X-Si(R)(OR)(Xrepresents a group containing a functional group reacting with at least one group selected from a hydroxyl group, an isocyanate group or a polymerizable carbon-carbon double bond-containing group, Rrepresents H or a hydrocarbon group having 1 to 8 carbon atoms, Rrepresents a hydrocarbon group having 1 to 8 carbon atoms, and a represents an integer of 0 to 2.)SELECTED DRAWING: None
机译:解决的问题:提供一种底涂剂,该底涂剂不仅在基材与铜薄膜之间的初始粘合性方面优异,而且在用碱溶液处理铜薄膜基材后在基材与铜薄膜之间的粘合性方面也优异。解决方案:提供一种用于带有铜薄膜的基材的底涂层剂,其包括:具有羟基,烷基酯基,腈基和伯酰胺基的丙烯酸共聚物(A);和具有酸性基团的底涂层剂。具有至少三个异氰酸酯基的多异氰酸酯(B);具有至少三个含碳-碳双键的基团的活性能量射线聚合性化合物(C);通式(1)表示的反应性烷氧基甲硅烷基化合物(D)X-Si(R)(OR)(X表示含有与选自羟基,异氰酸酯基或羟基的至少一个基团反应的官能团的基团。可聚合的含碳-碳双键的基团,R表示H或具有1至8个碳原子的烃基,R表示具有1至8个碳原子的烃基,并且a表示0至2的整数。

著录项

  • 公开/公告号JP6011895B2

    专利类型

  • 公开/公告日2016-10-25

    原文格式PDF

  • 申请/专利权人 荒川化学工業株式会社;

    申请/专利号JP20150191069

  • 发明设计人 東本 徹;山崎 彰寛;近藤 洋平;

    申请日2015-09-29

  • 分类号C09D133/00;B32B15/095;B32B15/08;C09D5/00;C09D175/04;C09D4/00;C09D133/20;C09D133/26;

  • 国家 JP

  • 入库时间 2022-08-21 14:43:27

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号