首页> 外文会议>NATO advanced research workshop on fundamental aspects of ultrathin dielectrics on si-based devices : Towards an atomic scale understanding >OPTICALLY INDUCED SWITCHING IN BISTABLE STRUCTURES: HEAVILY DOPED n~+- POLYSILICON - TUNNEL OXIDE LAYER - n - SILICON
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OPTICALLY INDUCED SWITCHING IN BISTABLE STRUCTURES: HEAVILY DOPED n~+- POLYSILICON - TUNNEL OXIDE LAYER - n - SILICON

机译:双稳态结构的光学诱导切换:重掺杂N〜+ - 多晶硅 - 隧道氧化物层 - N - 硅

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1. The presence of a n~+ -polysilicon electrode instead of a metal electrode gives additional specific features. For example, on the steady-state non-equilibrium depletion regime the bandgap in the gate electrode material blocks virtually completely the current transport channel associated with transfer of minority carriers (holes) from the valence band in n-Si into the gate material via surface states on the n-Si-SiO_2 interface (Fig.3a). For this reason, in the case of a polycrystalline silicon electrode the condition E_(Fm) -E_c (0) > 0 is more easily satisfied in the steady-state non-equilibrium depletion regime than in the case of a metal electrode [7]. A similar situation obtains in the "on" state: The lower the hole tunneling leakage current (I_(ss)) through the surface states at the n-Si-SiO_2 boundary, the greater the charge accumulated in the quasi-equilibrium hole layer and therefore the higher the voltage across the insulator.
机译:1.存在n〜+ -polysilicon电极代替金属电极提供额外的特定特征。例如,在稳态非平衡耗尽方案上,几乎完全地完全地完全地完全地完全地完全地完全地,与从N-Si中的价带中的少数载波(孔)的传递相关联的电流传输通道进入栅极材料通过表面在N-Si-SiO_2接口上的状态(图3A)。因此,在多晶硅电极的情况下,在稳态非平衡耗尽方案中比在金属电极的情况下更容易满足条件E_(FM)-e_C(0)> 0 [7] 。类似的情况在“ON”状态下获取:通过N-Si-SiO_2边界的表面状态下孔隧道漏电流(I_(SS))下降,在准平衡孔层中累积的电荷越大因此,绝缘体上的电压越高。

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