Correlation of stress with photodegradation in hydrogenated amorphous silicon prepared by hot-wire CVD

机译：热线CVD制备氢化非晶硅光降解应力的相关性

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An innovative bending-beam method is used to study the stress of thin film a -Si:H deposited on thin quartz by hot-wire chemical vapor deposition (CVD) techniques. When the deposition temeprature increases from 280 to 440 deg C the hydrogen content decreases from 8 to <1 at.

机译：通过热线化学气相沉积（CVD）技术，采用创新弯曲梁法研究薄膜A -SI的应力：H沉积在薄石英上。当沉积时间从280增加到440℃时，氢含量从8到<1℃下降。

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《Symposium on thin-films - Stresses and mechanical properties》|1998年||共6页
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Daxing Han; Tamihiro Gotoh; Motoi Nishio; Tomonari Sakamoto; Shuichi Nonomura; Shoji Nitta; Qi Wang; Eugene Iwaniczko; Materials Research Society;
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中图分类薄膜的性质;
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1. Sub-bandgap optical absorption spectroscopy of hydrogenated micro crystalline silicon thin films prepared using hot-wire CVD (Cat-CVD) process [J] . Goktas O, Isik N, Okur S, Thin Solid Films . 2006,第1a2期

机译：使用热线CVD（Cat-CVD）工艺制备的氢化微晶硅薄膜的亚带隙光学吸收光谱
2. Deposition of hydrogenated amorphous silicon (a-Si : H) films by hot-wire chemical vapor deposition (HW-CVD) method: Role of substrate temperature [J] . Jadkar SR, Sali JV, Funde AM, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2007,第8期

机译：通过热线化学气相沉积（HW-CVD）方法沉积氢化非晶硅（a-Si：H）膜：衬底温度的作用
3. Hydrogenated amorphous and polycrystalline silicon TFTs by hot-wire CVD [J] . Meiling H., Rath JK., Schropp REI., Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 1998,第Pta2期

机译：通过热线化学气相沉积法氢化非晶硅和多晶硅TFT
4. Correlation of stress with photodegradation in hydrogenated amorphous silicon prepared by hot-wire CVD [C] . Daxing Han, Tamihiro Gotoh, Motoi Nishio, Symposium on thin-films - Stresses and mechanical properties . 1998

机译：热线CVD制备氢化非晶硅光降解应力的相关性
5. Proton NMR studies of PECVD hydrogenated amorphous silicon films and HWCVD hydrogenated amorphous silicon films. [D] . Herberg, Julie Lynn. 2002

机译：PECVD氢化非晶硅膜和HWCVD氢化非晶硅膜的质子NMR研究。
6. Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene [O] . Martin Müller, Milan Bouša, Zdeňka Hájková, 2020

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7. Sub-bandgap optical absorption spectroscopy of hydrogenated microcrystalline silicon thin films prepared using hot-wire CVD (Cat-CVD) process [O] . Göktaş Oktay, Işık Nebile, Okur Salih, 2006

机译：使用热线CVD（Cat-CVD）工艺制备的氢化微晶硅薄膜的亚带隙光学吸收光谱

Correlation of stress with photodegradation in hydrogenated amorphous silicon prepared by hot-wire CVD

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