Electorchemical Fabrication of Multi Walled Micro Channels

摘要

Electrochemical etching of silicon results in the formation of porous silicon or the electroplishing of the silicon, depending on the current density during etching. Using alternatingly high and low current densities we have been able to make so-called Multi Walled Micro Channels (MWmuC's) from p-type silicon. MWmuC's are microchannels containing one or more free-standing layers of porous silicon separating several coaxial channels. These channels can be used in many devices, for instance microsieves, microbatteries, or porous electrodes.