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Growth, Structure and Photoluminescence of SiGe/Si quantum wires and dots on patterned Si (001) substrates

机译:SiGe / Si量子电线和图案化Si(001)基板上的小点的生长,结构和光致发光

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Self-organized growth of Si/SiiGtex/Si quantum wire and quantum dot structures on patterned Si(001) substrates during low pressure chemical vapour deposition was investigated for 0.2 <, x < 0.4 and for nominal layer thicknesses t < 4nm. Depositions were performed on V-shaped grooves bounded by {111} facets, grooves with L-shape cor-ners bounded by {111} and {100} facets, and inverse pyramids bounded by {111} facets. Structure, strain state and composition were analysed by transmission electron microscopy and by spatially resolved energy-dispersive X-ray spectroscopy. The results were compared with photoluminescence measurements.
机译:在低压化学气相沉积期间,研究了在低压化学气相沉积期间图案化Si(001)衬底上的Si / Siigtex / Si量子线和量子点结构的自组织生长0.2 <,x <0.4,并用于标称层厚度T <4nm。在由{111}小平面界定的V形槽上进行沉积,由由{111}和{100}小平面限定的L形圆圈的凹槽,以及由{111}小平面限定的逆金字塔。通过透射电子显微镜分析结构,应变状态和组合物,并通过空间分辨能量分散X射线光谱分析。将结果与光致发光测量进行比较。

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