首页>
外国专利>
- - method of patterning of quantum dot-polymer composite and substrate INCLUDING the patterned quantum dot-polymer composite
- - method of patterning of quantum dot-polymer composite and substrate INCLUDING the patterned quantum dot-polymer composite
展开▼
机译:--量子点-聚合物复合材料和衬底的图案化方法,包括图案化的量子点-聚合物复合材料
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of patterning a quantum dot-polymer composite and a substrate comprising a patterned quantum dot-polymer composite, wherein the method of patterning a quantum dot-polymer composite comprises the steps of placing a quantum dot-polymer (Quantum dot-polymer) on a substrate and The quantum dot-polymer is placed on the substrate imprinting lithography (imprinting lithography) and UV polymerization is performed, including the step of forming a patterned quantum dot-polymer composite on the substrate, the monomer and the polymer thiol (Thiol) The functionalized monomer and the polymer may be included, and the substrate may include a thiol-functionalized substrate.
展开▼