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Crack formation in tensile strained III-V epilayers grown on InP substrates

机译:在INP基材上生长的拉伸应变III-V副型裂缝形成

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摘要

Layers of InxGaAlx.xAs with x<0.53 grown on InP(OOl) are under tension. Beyond a critical thickness, governed by the lattice misfit, such layers prefer to relieve their stored energy by crack formation. In this paper, experimental observations of this critical thickness over a range of misfits are compared with the predictions of a simple theory. Measurements of crack profiles and separations have allowed us to estimate the amount of stored elastic energy in such layers and explain why cracks penetrate beyond the epilayer into the substrate.
机译:INXGAALX.XAS的层数为X <0.53在INP(OOL)上生长张力。除了由晶格错位控制的临界厚度之外,这种层宁可通过裂缝形成释放其储存的能量。在本文中,将这种临界厚度的实验观察与在一系列不足范围内的实验观察与简单理论的预测进行了比较。裂纹分布和分离的测量使我们能够估计这种层中的储存弹性能量,并解释为什么裂缝穿过外部渗透到基板上。

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