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首页> 外文期刊>Thin Solid Films >Anisotropic surface morphology in a tensile-strained InAlAs layer grown on InP(100) substrates
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Anisotropic surface morphology in a tensile-strained InAlAs layer grown on InP(100) substrates

机译:在InP(100)衬底上生长的拉伸应变InAlAs层中的各向异性表面形态

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摘要

The anisotropic surface morphology of a tensile-strained In0.42Al0.58As layer grown on an InP(100) substrate was investigated by means of observing the cross-hatch patterns between two orthogonal in-plane directions: [011] and [0 (1) over bar1]. Analysis results using atomic force microscopy evidently reveal a higher array density along direction [011], with an asymmetrically sharp ridge across each array. Conversely, there was a much lower array density along direction [0 (1) over bar1] and a symmetrically big mound-like ridges. Our X-ray diffraction and energy-dispersive spectroscopy analyses showed a more substantial amount of strain relaxation along direction [0 (1) over bar1] due to preferential indium incorporation along [011]. As a result, the big mound ridges over the arrays along direction [0 (1) over bar1] were believed to be the result of local indium accumulation. Additionally, microcrack formations, penetrating into substrates, were exclusively formed on top of the mound ridges with central depressions along direction [0 (1) over bar1], presumably causing additional anisotropic strain relaxation.
机译:通过观察两个正交的平面内方向:[011]和[0(1)之间的交叉影线图案,研究了在InP(100)衬底上生长的拉伸应变In0.42Al0.58As层的各向异性表面形态。 )超过bar1]。使用原子力显微镜的分析结果显然显示出沿方向[011]的阵列密度更高,每个阵列上都有不对称的尖脊。相反,沿着[bar1上的[0(1)]方向的阵列密度要低得多,并且具有对称的大丘状脊。我们的X射线衍射和能量色散光谱分析显示,由于沿[011]优先引入了铟,沿方向[0(1)比bar1]的应变松弛量更大。结果,沿方向[bar1上的0(1)]排列的大丘脊被认为是局部铟积累的结果。此外,渗透到基体中的微裂纹形成物仅在丘脊的顶部形成,中央凹陷沿方向[bar1上的0(1)],大概引起了各向异性应变的松弛。

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