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Electrical characterization of interconnects in polyimide-copper thin film multilayer on ceramic substrate

机译:聚酰亚胺铜薄膜多层陶瓷基材互连的电学特性

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摘要

A full electrical characterization of a polyimide-copper thin film multilayer on a ceramic substrate is presented. It contains test structures with three different types of ground, i.e., continuous solid ground, meshed ground with octagonal holes, and meshed ground with rectangular holes. The electrical performance in terms of impedance, effective permittivity constant, crosstalk noise and losses is discussed. The results show clearly the effects of ground openings on signal transmission.
机译:介绍了陶瓷基板上的聚酰亚胺 - 铜薄膜多层的全电学表征。它含有具有三种不同类型的地面的测试结构,即连续实线,带有八角形孔的啮合地,与矩形孔的啮合。讨论了阻抗,有效介电常数,串扰噪声和损耗方面的电气性能。结果显然显示了接地开口对信号传输的影响。

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