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Electrical characterization of interconnects in polyimide-copper thin film multilayer on ceramic substrate

机译:陶瓷基板上聚酰亚胺-铜-铜薄膜多层中互连的电学特性

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摘要

A full electrical characterization of a polyimide-copper thin film multilayer on a ceramic substrate is presented. It contains test structures with three different types of ground, i.e., continuous solid ground, meshed ground with octagonal holes, and meshed ground with rectangular holes. The electrical performance in terms of impedance, effective permittivity constant, crosstalk noise and losses is discussed. The results show clearly the effects of ground openings on signal transmission.
机译:提出了在陶瓷基板上的聚酰亚胺-铜薄膜多层的完整的电气特性。它包含具有三种不同类型地面的测试结构,即连续实心地面,具有八边形孔的网格化地面和具有矩形孔的网格化地面。讨论了在阻抗,有效介电常数,串扰噪声和损耗方面的电气性能。结果清楚地表明了接地孔对信号传输的影响。

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