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RF performance characteristics of InP millimeter-wave n/sup +/-n/sup -/-n/sup +/ Gunn devices

机译:射频性能特性INP毫米波N / SUP +/-N / SUP - / - N / SUP + / GUNN设备

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A selective etching technology for the fabrication of InP Gunn devices on diamond heat sinks was established recently. Using MOCVD-grown material, state-of-the-art RF power levels of more than 130 mW at 131.7 GHz and more than 60 mW at 151 GHz were obtained in the fundamental mode. No deterioration was observed in one of these devices monitored for more than 6500 hours. Power combining of two devices resulted in an RF output power of 130 mW at 136 GHz with a combining efficiency of more than 85%. After evaluating CBE-grown material with devices on integral heat sinks, different doping profiles for devices operating at D-band frequencies were designed and grown in a CBE system. Preliminary results with RF power levels of more than 100 mW around 130 GHz indicate that CBE can provide the high-quality material required for InP Gunn devices and that RF power levels above 150 GHz can be increased significantly with optimized device structures. No differences in the excellent noise performance of devices fabricated from either MOCVD- or CBE-grown material were found.
机译:选择性对金刚石散热器的InP耿氏器件的制造中的蚀刻技术最近成立。使用MOCVD生长的材料,在131.7 GHz和超过130毫瓦的状态的最先进的RF功率水平超过60毫瓦,在151 GHz的是在基本模式中获得。未见恶化,这些设备中的一个监测6500多小时。功率两个器件的组合产生了130毫瓦的在136 GHz的具有大于85%的效率相结合的RF输出功率。与集成热沉设备评估CBE-生长的材料后,在d波段频率中操作的设备不同的掺杂分布,设计并在CBE系统生长。有超过100毫瓦大约130千兆赫的RF功率水平的初步结果表明,CBE可以提供的InP耿氏设备和150GHz以上该RF功率水平所需的高品质的材料可具有优化的器件结构显著增加。在器件的优良的噪声性能没有差异从任MOCVD-或CBE生长材料制成被发现了。

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