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AIPSb/InP Single-Straight Transition Bipolar Transistor to InP substrate for high-speed and high-performance applications

机译:AIPSb / InP单直过渡双极晶体管到InP衬底,用于高速和高性能应用

摘要

An epitaxial struture (10) and method of manufacture for a single heterojunction bipolar transistor capable of being utilized in high-speed and high-power applications. Preferably, the epitaxial structure comprises an N-type collector (18) made from InP, a P-type base (16) made from InP, and an N-type emitter (12) made from a semiconductor material of approximately 39 mole percent AlP and approximately AlSb mole percent Sb. IMAGE
机译:用于能够在高速和高功率应用中使用的单个异质结双极晶体管的外延结构(10)和制造方法。优选地,外延结构包括由InP制成的N型集电极(18),由InP制成的P型基极(16)和由大约39摩尔%的AlP的半导体材料制成的N型发射极(12)。和大约AlSb摩尔百分比的Sb。 <图像>

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