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Thermal Annealing Induced Modifications on the Structural and Optical Properties of AgInSe_2 Thin Film

机译:热退火诱导对Aginse_2薄膜结构和光学性质的修饰

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In the present study, 300 nm thick films of AgInSe_2 were prepared by selenization of the multilayer of Ag/In/Ag/In deposited by DC magnetron sputtering. Selenization was done at the 300 C and a few of the selenized film were annealed at 500 C. The films were characterized by X-ray diffraction (XRD) and UV-Visible-NIR spectroscopy. XRD revealed the presence of about 24 vol% of Ag_2Se as impurity phase in the AgInSe_2 films, which were only selenized. Annealing of the selenized films at 500 C suppressed the impurity phase to about 5 vol%. Annealing also led to increase of crystallite size and improvement of crystallinity. Associated with the suppression of the impurity phase, the band gap of the film was found to increase on annealing at 500 C.
机译:在本研究中,通过DC磁控溅射沉积的Ag / In / Ag / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / Al / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / In / Al / Al。硒化在300℃下进行,并在500℃下退火少量硒化膜。通过X射线衍射(XRD)和UV可见 - Nir光谱表征膜。 XRD揭示了Ag_2Se的约24体积%的Ag_2Se作为杂质相,仅为硒化。将硒化薄膜在500℃下抑制杂质相至约5体积%。退火也导致了微晶尺寸和结晶度的改善。与抑制杂质相的抑制相关,发现薄膜的带隙在500℃下增加退火。

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