首页> 外文会议>DAE Solid State Physics Symposium >Influence of Boron Doping on the Structural, Optical and Electrical Properties of CdO thin films by Spray Pyrolysis Technique
【24h】

Influence of Boron Doping on the Structural, Optical and Electrical Properties of CdO thin films by Spray Pyrolysis Technique

机译:硼掺杂对CDO薄膜的结构,光学和电性能喷雾热解技术

获取原文
获取外文期刊封面目录资料

摘要

Cadmium oxide and Boron (B) doped Cadmium oxide thin films were deposited using spray pyrolysis technique. The structural, morphological, electrical and optical properties of undoped and B doped CdO films are analyzed by varying the dopant concentration in the solution. The structural study shows the polycrystalline nature and cubic structure of undoped and B doped CdO thin films. Surface morphological study reveals that the grains are spherical in shape. Optical and electrical studies showed n-type semiconducting nature and optical band gap of 2.44 eV of deposited thin films.
机译:使用喷雾热解技术沉积氧化镉和硼(B)掺杂氧化镉薄膜。通过改变溶液中的掺杂剂浓度来分析未掺杂和B掺杂CDO膜的结构,形态,电学和光学性质。结构研究表明了未掺杂的多晶性质和立方结构,B掺杂CDO薄膜。表面形态学研究表明,晶粒是球形的。光学和电气研究表明,沉积薄膜的2.44eV的N型半导体性质和光学带隙。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号