首页> 外文会议>DAE Solid State Physics Symposium >100 MeV Ag Ion Irradiation Induced Structural and Optical Modifications in PLD Grown Tin Oxide Thin Films
【24h】

100 MeV Ag Ion Irradiation Induced Structural and Optical Modifications in PLD Grown Tin Oxide Thin Films

机译:100 MeV Ag离子辐照诱导PLD种植氧化锡薄膜的结构和光学修饰

获取原文

摘要

Tin oxide thin films were deposited by pulsed laser deposition (PLD) technique on quartz and Si substrates. The as-deposited films were irradiated using 100 MeV Ag ions at different fluencies. The as-deposited and irradiated films have been characterized using XRD and UV-Vis techniques to study the changes in structural and optical properties. Crystallinity has decreased and band gap has increased from 3.92 eV to 4.24 eV as indicated by XRD and UV-Vis spectroscopy.
机译:通过在石英和Si基板上通过脉冲激光沉积(PLD)技术沉积氧化锡薄膜。在不同流量的100meV Ag离子使用100meV Ag离子进行沉积的薄膜。已经使用XRD和UV-VIS技术表征了沉积的和辐照薄膜,以研究结构和光学性质的变化。结晶度降低,带隙从3.92eV增加到4.24eV,如XRD和UV-Vis光谱所示。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号