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Magnetism in Ge_(1-x) Mn_(x) Thin Films andQuantum Dots Synthesized by Ion Implantation

机译:Ge_(1-x)Mn_(x)薄膜的磁性薄膜通过离子植入合成

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Spin switching devices constructed using self-assembled magnetic Ge quantum dots are the ultimate goal of this effort. These devices are based on the manipulation of magnetic exchange between magnetic quantum dots and/or coherent spin states in the quantum dots. In this study, we introduced 1.1 atomic % of Mn ions into Ge thin films and 3 at.% Mn into Ge Quantum Dots by ion implantation in order to explore the ferromagnetism in Mn implanted Ge. In order to recrystallize the Ge and enhance the incorporation of Mn ions into the Ge lattice, rapid thermal annealing was applied following the implantation. A maximum saturation moment of 0.7 μ_B/Mn at 5 K was reached when the sample was annealed at 300°C and the moment decreased with higher annealing temperatures. The ferromagnetism in Mn:Ge thin films disappeared at ~15 K. However, superparamagnetism has been observed at 1 T up to 200 K for the 300°C annealed film and persisted to room temperature for the 400°C annealed film. Mn implanted Ge Quantum Dots were also found to be ferromagnetic at low temperatures and showed a superparamagnet transition around 200 K.
机译:使用自组装磁性GE量子点构造的自旋开关装置是这项努力的最终目标。这些装置基于量子点中的磁量子点和/或相干旋转状态之间的磁交换的操纵。在这项研究中,我们通过离子注入将1.1原子%的Mn离子介绍到Ge薄膜和3.%Mn进入Ge量子点。为了探讨Mn注入Ge中的铁磁性。为了将GE重结晶并增强Mn离子的掺入Ge晶格中,在植入后施加快速的热退火。当样品在300℃下退火时,达到5k的最大饱和矩0.7μm/ mn,并且随着退火温度较高的时刻降低。 Mn中的铁磁性:Ge薄膜在〜15 k下消失。然而,对于300°C退火薄膜,在1℃下观察到超级切片,持续到400°C退火薄膜的室温。 MN植入的GE量子点也被发现在低温下是铁磁性的,并且显示了200k左右的超分析过渡。

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