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Single crystalline BaTiO_3 thin films synthesized using ion implantation induced layer transfer

机译:离子注入诱导层转移合成BaTiO_3单晶薄膜

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摘要

Layer transfer of BaTiO3 thin films onto silicon-based substrates has been investigated. Hydrogen and helium ions were co-implanted to facilitate ion-implantation-induced layer transfer of films from BaTiO3 single crystals. From thermodynamic equilibrium calculations, we suggest that the dominant species during cavity nucleation and growth are H2, H+, H2O, Ba2+ and Ba–OH, and that the addition of hydrogen to the Ba–Ti–O system can effectively suppress volatile oxide formation during layer transfer and subsequent annealing. After ion implantation, BaTiO3 layers contain microstructural defects and hydrogen precipitates in the lattice, but after layer transfer, the single crystal is found to be stoichiometric. Using direct wafer bonding and layer splitting, single crystal BaTiO3 thin films were transferred onto amorphous Si3N4 and Pt substrates. Micro-Raman spectroscopy indicated that the density of defects generated by ion implantation in BaTiO3 can be significantly reduced during post-transfer annealing, returning the transferred layer to its single crystal state. Characterization using piezoresponse force microscopy shows that the layer transferred thin films are ferroelectric, with domain structures and piezoresponse characteristics similar to that of bulk crystals.
机译:研究了BaTiO3薄膜在硅基衬底上的层转移。共注入氢和氦离子以促进离子注入引起的BaTiO3单晶薄膜的层转移。根据热力学平衡计算,我们认为腔核和生长过程中的主要物质为H2,H +,H2O,Ba2 +和Ba-OH,并且向Ba-Ti-O系统中添加氢可以有效地抑制在形成过程中挥发性氧化物的形成。层转移和随后的退火。离子注入后,BaTiO3层包含微结构缺陷,并且氢在晶格中沉淀,但是在转移之后,发现单晶是化学计量的。使用直接晶片键合和层分裂,将单晶BaTiO3薄膜转移到非晶Si3N4和Pt衬底上。显微拉曼光谱表明,在转移后的退火过程中,BaTiO3中离子注入产生的缺陷密度可以大大降低,使转移的层回到其单晶状态。使用压电响应力显微镜的表征表明,层转移的薄膜是铁电的,其畴结构和压电响应特性与块状晶体相似。

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