Practical Laser Mask Repair in the Contemporary ProductionEnvironment

摘要

It has been found that the femtosecond DUV laser mask repair tool has significant utility in the repair of unknownforeign material (FM) contamination of sizes ranging from 50 nm to 30 μm with highly variable z-heights bothisolated and within critical complex patterns. Another significant ROI is the repair of masks which have alreadybeen pelliclized (through pellicle repair or TPR) where the laser repair tool may work in conjunction with existingthrough-pellicle inspection hardware to detect and remove FM and correct pattern errors. The capability of the toolis also explored for repairs in patterns including the 45 nm technology node.