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6H(n~+)/3C(n)/6H(p~+) - SiC Structures Grown by Sublimation Epitaxy

机译:6h(n〜+)/ 3c(n)/ 6h(p〜+) - 通过升华外延生长的SiC结构

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Investigation of the multilayer 6H(n~+)/3C(n)/6H(p~+)-SiC heterostructure grown by sublimation epitaxy show that the injection electroluminescence (IEL) in the green region (hν_(max)≈2.30-2.35eV) of spectrum is dominant. This band is close to the electroluminescence peak due to defects in 6H-SiC but also can be due to free exciton annihilation in a quantum well in 3C-SiC at the 6H/3C-SiC heterointerface. At high current the IEL peak at hν_(max)≈2.9 eV is found. This peak (and also two another peaks in blue part of spectra: hν_(max)≈2.6 eV and hν_(max)≈2.72 eV) can be attributed to recombination in 6H-SiC. The forward current-voltage characteristics for best structures are close to those for ideal 6H-SiC pn homostructure and characterized by abrupt breakdown. A lot of structures are characterized by barrier type excess current. Structure in the region of evident 3C-SiC inclusion is characterized by high forward and reverse excess currents.
机译:通过升华外延生长的多层6H(N〜+)/ 3C(N)/ 6H(P〜+) - SiC异质结构的研究表明,绿色区域中的注射电致发光(IEL)(Hν_(MAX)≈2.30-2.35 Spectrum的EV是显性的。由于6H-SiC中的缺陷,该带接近电致发光峰值,但也可以是由于在6H / 3C-SiC异化面上的3C-SiC中的量子孔中的自由激子湮灭。在高电流下,发现Hν_(MAX)的IEL峰值是≈2.9eV。该峰值(以及光谱的蓝色部分中的另一个峰值:Hν_(max)≈2.6ev和hν_(max)≈2.72ev)可归因于6h-siC中的重组。最佳结构的前电流电压特性接近于理想的6h-SiC PN主体结构,其特征在于突然分解。大量结构的特征在于屏障型过度电流。明显的3C-SiC夹杂区域的结构特征在于高前进和反向过量的电流。

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