Optical properties and electrochromic performance tungsten trioxide thin films doped with terbium prepared by magnetron sputtering deposition

摘要

In this work, electrochromic tungsten oxide thin films doped with terbium were deposited by radio frequency magnetron sputtering deposition. The samples were analyzed with scanning electron microscopy (SEM), atomic force microscopy (AFM) and x-ray diffraction (XRD). The films were amorphous and the thickness of the films is about 250 nm. From the result of AFM, the WO3 films doped with terbium are porous and the sample doped with 1.95% Tb has more porosities than undoped sample. Cyclic voltammetry experiments were performed to investigate the influence of terbium content on the electrochromic performance of the films. When the terbium content is equal to 1.95%, the cell capacity owns the best electrochromic capability. Measurement of optical transmission measurement for W-Tb-O thin films was carried out by a double-beam UV-VIS-NIR spectrophotometer with a wavelength range from 380 nm to 900 nm. In the different wavelength ranges, the films have different transmittance changes for the bleaching and colored state.