Optical and Electrochromic Properties of TiO_2Films Prepared by Using RF-Magnetron Sputter Deposition

摘要

Electrochromic TiO_2films were deposited on indium tin oxide (ITO) coated substrates at roomtemperature by using reactive radio frequency (RF) magnetron sputtering in an Ar/O_2 sputteringatmosphere, and their optical and electrochromic properties were investigated in relation to theO_2content in an Ar/O_2sputtering atmosphere. Li~+intercalation/deintercalation showed that theelectrochromic .properties and the stability of the as-deposited films strongly depended on the O_2content in the sputtering atmosphere. The TiO_2films formed in an Ar~+and 10 ~ 15 sccm O_2gasmixture were found to remain transparent, regardless of the Li~+ion content. This material can alsobe used as a passive counter electrode in electrochromic devices.