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A SIMPLE METHOD TO MODEL NONRECTANGULAR-GATE LAYOUT IN SOI MOSFETS

机译:SOI MOSFET中非连接 - 栅极布局的简单方法

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摘要

A simple method to obtain an analytical current model for nonrectangular-gate layout in SOI MOSFETs is presented, based on partition of the original layout into trapezoidal parts, and modeling these trapezoids by a closed form expression. A generic shape factor is defined for comparison between devices of different shapes in the same technology. Three-dimensional simulation and some experimental results were carried out to verify the method accurateness. The obtained expression showed good agreement both to simulation and experimental results. The method can be applied to a wide range of gate layout shapes.
机译:基于原始布局的分区进入梯形部件的分隔,并通过闭合形式表达,向SOI MOSFET中获得非切割栅极布局的分析电流模型的简单方法。 定义了通用形状因子,用于相同技术中不同形状的设备之间的比较。 进行三维仿真和一些实验结果以验证方法精确性。 所获得的表达显示既符合模拟和实验结果良好的一致性。 该方法可以应用于各种栅极布局形状。

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