Single Step Direct-Write Photomask Made From Bimetallic Bi/In Thermal Resist

摘要

A new single step direct-write photomask process has been proposed by using Bi/In bimetallic thermal resist which turns almost transparent with high energy laser exposure. The Bi over In metallic films, each layer ～40 nm thick, were DC-sputtered onto quartz mask plate substrates in a single pump-down chamber. Before laser exposure the Bi/In had 2.91 Optical Density. Bi/In is a bimetallic thermal resist and hence shows near wavelength invariance exposure sensitivity from Near IR to UV light. For Bi/In exposure, up to 0.9 W Argon laser (514 nm) beam was focused by an f=50 mm lens to a 10 micron spot. When writing a mask the Bi/In coated sample was placed on a computer-controlled high accuracy X-Y table and the pattern was raster-scanned by the laser at 10mm/sec. After exposure the Bi/In film became nearly transparent (0.26 OD) at I-line (365 nm) wavelength, and remained conductive. Bi/In photomasks have been used together with a standard mask aligner to pattern the oxide and Al layer during the manufacturing of test solar cell devices in the lab. Experiments also showed that annealing the as-deposited films at 90°C before laser exposure increase the Bi/In transparency.