RESIST COATING METHOD, RESIST COATING APPARATUS, AND MANUFACTURING METHOD OF PHOTOMASK BLANK AND PHOTOMASK USING RESIST COATING METHOD

摘要

The invention provides a resist coating method, a resist coating device, and a method for manufacturing photomask plates and photomasks using the resist coating method, which enable rapid and even drying of resist coated surface by using a nozzle with capillary gaps. The resist coating method is a method of coating resist liquid downwards onto surface (10a) of a substrate (10) to be coated. In the method, a resist liquid stored in a liquid tank is guided to the surface to be coated under capillarity of the nozzle (24) to connect with liquid on the surface (10a) to be coated, and the nozzle (24) and the substrate (10) move relatively at the horizontal direction so as to coat the resist liquid (110) onto the surface (10a) to be coated. Air flow substantially stable relative to flow speed at a given direction and parallel to the surface (10a) to be coated is supplied to the surface (10a) to be coated so that the air flow contacts with the resist liquid (110) coated to dry the resist liquid (110).