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Optical and Tribological Properties of Silicon Carbide Thin Films Grown by Reactive. DC Magnetron Sputtering

机译:反应生长的碳化硅薄膜的光学和摩擦学特性。 DC磁控溅射

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摘要

In this study, SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target in Ar/CH_4 gas mixture. Three types of substrates, AISI M2 grade high speed steel, glass, and Si (100) were used in each deposition. Films were grown with different compositions at 50 °C and 250 °C by varying (0-50 %) CH_4/Ar processing gas ratios. Microstractural properties of SiC films were characterized by cross-sectional FE-SEM (Field-Emission Scanning Electron Microscope) observations. XRD (X-Ray Diffraetometer) results indicated that films were amorphous. Friction coefficients as low as O.lwere obtained from SiC coatings against Al_2O_3 balls, according to the tribological tests. Optical investigations showed that the transparency and opacity of SiC films could easily be tailored by modifying Si and C concentrations in the coatings.
机译:在该研究中,通过在Ar / CH_4气体混合物中的高纯度(99.999%)Si靶标的反应性DC磁控溅射沉积SiC膜。在每次沉积中使用三种类型的基材,AISI M2级高速钢,玻璃和Si(100)。通过不同(0-50%)CH_4 / AR加工气体比,在50℃和250℃下在50℃和250℃下使用不同的组合物生长薄膜。通过横截面Fe-SEM(现场 - 发射扫描电子显微镜)观察,表征SiC膜的微动性能。 XRD(X射线差异计)结果表明,薄膜是无定形的。根据摩擦学检验,从SiC涂层获得的摩擦系数低至Al_2O_3球。光学研究表明,通过在涂层中改变Si和C浓度,可以容易地定制SiC膜的透明度和不透明度。

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