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Fabrication and characteristics of silicon vacuum nanodiodes

机译:硅真空纳米二极管的制造和特性

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Nanoscale vacuum devices have previously been fabricated using a granular AuPd self-aligned mask to produce both diode and triode structures [1]. The cathode structure consisted of an array of tungsten field emitter pillars, each capped with a AuPd grain, of diameter 1nm and height 10nm approximately. These devices exhibited very low turn-on voltages (typically less than 10V) and could be operated in air or vacuum as the mean free path of electrons of this energy was less than the anode-cathode separation.In these devices the field-emitted current is dominated by emission from a single most-favoured pillar, which could easily be destroyed by excessive current. This resulted in steps in the emission current as successor pillars (next most-favoured) took over and non-traceability in I-V sweeps. In triode devices, but not diode devices, operated at currents below the threshold for damage, repeatable fluctuations in transconductance were observed. These fluctuations were attributed to electron wave interference effects in the collimated beam of the triode between the anode and cathode [2]. The observation of these quantum effects implied a very high degree of source coherence from the nanoscale field emitter. In this study the effect of introducing a semiconductor based barrier, between the AuPd grain and the cathode terminal connection, is studied.
机译:先前使用粒状AUPD自对准掩模制造纳米级真空装置,以产生二极管和三极管结构[1]。阴极结构由一系列钨场发射极柱组成,每个阵列用AUPD晶粒覆盖,直径为1nm和高度10nm。这些器件呈现出非常低的导通电压(通常小于10V),并且可以在空气中或真空操作,因为这种能量的电子的平均自由路径小于阳极 - 阴极分离。这些装置是现场发射的电流由一个最有利的支柱排放来源,这很容易被过度的电流破坏。这导致排放电流的步骤作为继任柱(下一个最有利)接管和在I-V扫描中的不可追溯。在三极管装置中,但不是在低于损坏阈值的电流下操作的二极管器件,观察到跨导的可重复波动。这些波动归因于阳极和阴极之间的三极管的准直光束中的电子波干扰效应[2]。观察这些量子效应隐含着从纳米级场发射器的非常高度的源相干性。在该研究中,研究了在AUPD谷物和阴极端子连接之间引入基于半导体的屏障的效果。

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