首页> 外文会议>International Workshop on the Physics of Semiconductor Devices >Fabrication of 3-D PDMS nano-template for UV nano-imprint Lithography and Micro contact Printing by means of Grey Scale Electron Beam Lithography
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Fabrication of 3-D PDMS nano-template for UV nano-imprint Lithography and Micro contact Printing by means of Grey Scale Electron Beam Lithography

机译:用灰度电子束光刻制备UV纳米压印光刻和微接触印刷的3-D PDMS纳米模板

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The fabrication process of PDMS embossing tools for nano scale pattern transfer like it is used for step and flash imprint lithography and micro contact printing has been investigated. We added an electroplating process to achieve a mother mask for the PDMS tool that withstands a lifetime use without any kind of abrasion. The work will focus on the pattern preparation and the process step of 3-dimensional e-beam lithography. Furthermore the realization into nickel and subsequently molding into PDMS will be described.
机译:研究了PDMS压花工具的制造过程,如将用于步骤和闪光印记光刻和微接触印刷的纳米尺度图案转印。我们添加了一个电镀过程,以实现用于PDMS工具的母罩,该工具可承受寿命使用而无需任何类型的磨损。该工作将专注于三维电子束光刻的图案准备和过程步骤。此外,将描述进入镍并随后模制到PDMS中的。

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