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Study on the New Type of Dissolution Inhibition/Dissolution Acceleration Compounds Used in Positive Photoresists

机译:阳性光致抗蚀剂中使用的新型溶出抑制/溶解加速化合物的研究

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摘要

We synthesized a new type of dissolution inhibition-dissolution-acceleration compounds with good performances. In the structures of these compounds, some have acid-labile ester group (active ester group) and acid-labile ether group (active ether group); some have phenolic lactone and acid-labile ether group. While used as dissolution inhibition/dissolution-acceleration components in photoresists, in the presence of the acid generated by light or heat, they are decomposed rapidly and become easily soluble from hardly soluble in dilute alkali aqueous, then the images are obtaied.
机译:我们合成具有良好性能的新型溶解抑制溶解 - 加速化合物。在这些化合物的结构中,有些具有酸不稳定酯基(活性酯基)和酸不稳定醚基(活性醚组);有些具有酚醛内酯和酸不稳定的醚基。在用作光致抗蚀剂中的溶解抑制/溶解 - 加速度组分的同时,在通过光或热产生的酸存在下,它们迅速分解并容易溶于稀碱水溶液中的易溶性,然后图像被淘汰。

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