首页> 外国专利> DISSOLUTION INHIBITOR FOR CHEMICAL AMPLIFICATION TYPE PHOTORESIST AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING SAME

DISSOLUTION INHIBITOR FOR CHEMICAL AMPLIFICATION TYPE PHOTORESIST AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING SAME

机译:化学增幅型光致抗蚀剂的溶解抑制剂和化学增幅型光致抗蚀剂组合物

摘要

PROBLEM TO BE SOLVED: To obtain a dissolution inhibitor for a chemical amplification type photoresist and a chemical amplification type photoresist compsn. contg. the dissolution inhibitor. ;SOLUTION: The dissolution inhibitor for a chemical amplification type photoresist is a compd. prepd. by bonding a dialkyl malonate group that causes a chemical reaction under an acid as a working group to a 1-40C hydrocarbon compd. The chemical amplification type photoresist compsn. contg. the dissolution inhibitor is suitable for forming a high-contrast superior profile pattern having a high thermal decomposition temp.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:获得用于化学放大型光致抗蚀剂和化学放大型光致抗蚀剂组合物的溶解抑制剂。续溶解抑制剂。 ;解决方案:化学放大型光刻胶的溶解抑制剂是一种复合物。准备通过将在酸作为工作基团下引起化学反应的丙二酸二烷基酯与1-40C的烃键合。化学放大型光刻胶组成。续该溶解抑制剂适合于形成具有高热分解温度的高对比度优良轮廓图案。; COPYRIGHT:(C)1999,JPO

著录项

  • 公开/公告号JPH11352696A

    专利类型

  • 公开/公告日1999-12-24

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP19980306978

  • 发明设计人 CHOI SANG-JUN;

    申请日1998-10-28

  • 分类号G03F7/039;G03F7/004;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 01:58:59

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