首页> 外文会议>8th International Conference on Radiation Curing May 15-19, 2001 Kunming, China >Study on the New Type of Dissolution Inhibition/Dissolution Acceleration Compounds Used in Positive Photoresists
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Study on the New Type of Dissolution Inhibition/Dissolution Acceleration Compounds Used in Positive Photoresists

机译:用于正性光刻胶的新型溶解抑制/溶解促进化合物的研究

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We synthesized a new type of dissolution inhibition-dissolution-acceleration compounds with good performances. In the structures of these compounds, some have acid-labile ester group (active ester group) and acid-labile ether group (active ether group); some have phenolic lactone and acid-labile ether group. While used as dissolution inhibition/dissolution-acceleration components in photoresists, in the presence of the acid generated by light or heat, they are decomposed rapidly and become easily soluble from hardly soluble in dilute alkali aqueous, then the images are obtaied.
机译:我们合成了一种新型的具有良好性能的溶解抑制-溶解-促进化合物。在这些化合物的结构中,一些具有酸不稳定的酯基(活性酯基)和酸不稳定的醚基(活性醚基)。一些具有酚内酯和酸不稳定的醚基。当用作光致抗蚀剂中的溶解抑制/溶解促进组分时,在由光或热产生的酸的存在下,它们迅速分解并从难溶于稀碱水溶液中变得易于溶解,然后获得图像。

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