首页> 外国专利> ORTHO-NITROBENZYL ESTER COMPOUND HAVING ABILITY RESTRAINING THE DISSOLUTION OF AN ALKALI-DEVELOPABLE RESIN IN NON-EXPOSURE PART, AND A POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

ORTHO-NITROBENZYL ESTER COMPOUND HAVING ABILITY RESTRAINING THE DISSOLUTION OF AN ALKALI-DEVELOPABLE RESIN IN NON-EXPOSURE PART, AND A POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

机译:能够抑制非暴露部分的碱可显影树脂和构成该感光材料的正型光敏树脂组合物的邻硝基苯甲酸酯化合物

摘要

PURPOSE: An ortho-nitrobenzyl ester compound is provided to restrain the dissolution of non-exposure part, and to provide a positive type photosensitive resin composition with excellent sensitivity, resolution, pattern formation, and removal of residue.;CONSTITUTION: An ortho-nitrobenzyl ester compound comprises a compound in chemical formula 1. In chemical formula 1, R^1 and R^2 is respectively and independently C1-20 aliphatic organic group, or a substituted or unsubstituted cycloaliphatic organic group, R^3 and R^4 is respectively and independently single bond, or substituted or unsubstituted divalent C1-20 aliphatic organic group, and Z^1 and Z^2 is respectively and independently a hydroxy group, an amine group, a carboxy group, or an aldehyde group, n1 and n2 is respectively and independently an integer from 0-5, and n1+n2 is an integer from 1-5.;COPYRIGHT KIPO 2012
机译:目的:提供一种邻硝基苄基酯化合物,以抑制非曝光部分的溶解,并提供一种具有优异的感光度,分辨率,图案形成和残留物去除能力的正型光敏树脂组合物;组成:邻硝基苄基酯化合物包括化学式1的化合物。在化学式1中,R ^ 1和R ^ 2分别独立地为C1-20脂族有机基团,或取代或未取代的脂环族有机基团,R ^ 3和R ^ 4为n 1和n 2分别独立地为单键或取代或未取代的二价C 1-20脂族有机基团,并且Z ^ 1和Z ^ 2分别独立地为羟基,胺基,羧基或醛基。分别独立地是0-5的整数,n1 + n2是1-5的整数。; COPYRIGHT KIPO 2012

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